Titanium Niobium
Tantalum Niobium Sputtering Target Description
Titanium Niobium sputtering target is fabricated by means of vacuum melting or power metallurgy. The typical Titanium content is 66% (approximately 50 weight %). It is an extraordinary superconductivity material and could be made into a variety of compound practical materials by conventional deformation and heat treatment process.
Titanium Niobium Sputtering Target Packaging
Our Titanium Niobium sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
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’s Titanium Niobium sputtering targets are of ultra-high purity and uniform. They are available in various forms, purities, sizes, and prices.
We could supply a variety of geometric forms: tubes, arc cathodes, planar or custom-made. Our products feature excellent mechanical properties, homogeneous microstructure, polished surface with no segregation, pores, or cracks.
We specialize in producing high purity thin film coating materials with excellent performance as well as the highest possible density and smallest possible average grain sizes for use in mold coating、decoration、automobile parts、low-E glass、semi-conductor integrated circuit、thin film resistance、graphic display、aerospace、 magnetic recording、touch screen、thin film solar battery and other physical vapor deposition (PVD) applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.
